Flat silicon wafer with nanoscale air holes used as ultraviolet focusing mirror

Silicon wafers with air holes create flat ultraviolet focusing mirrors for compact optics

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Researchers have developed a method to turn silicon wafers into flat ultraviolet focusing mirrors by introducing air holes, overcoming the challenge of UV light absorption in traditional metasurface materials. This advancement could enable compact optical systems for high-resolution imaging, spectroscopy, and sensing in the ultraviolet spectrum. The innovation addresses the limitations of curved lenses and mirrors by using flat nanoscale structures to control light phase.

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Originally published by gnews